A.V. Kiyanova, M. K. Efremov, Padma Gopalan, J.J. McCarthy, NSEC facilities
A new campus lab dedicated to nano patterning and associated metrology
Goal: To address needs of NSEC groups and UW campus at large, to pattern materials from self-assembled polymers and for BioMEMS.
Full Nanolithography Facility
Spinners, wet chemistry Hood
Exposure and patterning: EBL
Processing: resist, metal deposition
Metrology : SEM, AFM, Optical Microscope, thin film thickness